Siddhartha Das

Prof. Siddhartha Das delivered an invited talk in the Department of Mechanical and Aerospace Engineering in SUNY Buffalo. The title of his talk was “Soft and Active Interfaces: Enhanced Liquid Flows in Polymer-Functionalized Nanochannels, Self-Assembly via Active Drops, and Reduced Conductivity of Printed Nanoparticle Traces”

In this paper, we employ all-atom MD simulations for studying the behavior of cationic brushes in presence of different halide counterions. This is Raashiq’s 5th paper from the group. Congratulations !!!!!

In this paper, we propose a theory for studying the evaporation of active drops. This is the first paper from the group on active drops. This is Ghansham’s 3rd paper and Vishal’s 24th paper. Congrats All !!!!

In this paper, we study the impact-driven coalescence between two dissimilar polymeric drops. This is Arka’s 2nd paper and Vishal’s 24th paper from the group.

In this paper, we fabricate soft PDMS based magnetic films and test their robustness in presence of different types of deformations. This is Swarup’s 6th paper and Beihan’s 10th paper from the group. Congrats !!!!!!

In this paper, we employ a combination of all-atom-MD-machine-learning approach to quantify water-water hydrogen bonding inside anionic polyelectrolyte brush layer with different charge fractions. This is Arka’s 1st paper, Tanmay’s 3rd paper, Raashiq’s 4th paper, Turash’s 13th paper from the group.

In this paper (1st acceptance of 2024), we employ all-atom MD simulations to probe the effect of the brush sizes and the number of side-chain monomers on the properties of uncharged bottlebrush polymers (BBPs) and BBP-supported water molecules. This is Tanmay’s 2nd paper and Raashiq’s 3rd paper from the group. Congrats!!!

Prof. Das delivers an invited talk, titled “Soft and Active Interfaces: From Polymer-Grafted Nanochannels for Enhanced Liquid Flowsto Self-Assembly via Active Drops” at IIT Kharagpur

In this paper, we employ all-atom MD simulations for probing the water and ion behavior inside cationic brush layer. This is Raashiq’s 2nd paper, Tanmay’s 1st paper, and Arka’s 1st paper from the group. Congratulations to All !!!!

Included in the Stanford University list of world’s top 2% scientists based on the citations for the year 2022 [The rank is 63,032 (with self-citations) and 68,951 (without self-citations). The rank is 878 among 100,804 researchers in the sub-field of Chemical Physics.